很高兴邀请到美国阿贡国家实验室能源系统部的Dr.Jeffrey W. Elam和Dr. Anil U. Mane来校交流并做报告。
报告题目1：Synthesis, Characterization, and Applications of Nanocomposite Coatings with Tunable Properties Prepared by Atomic Layer Deposition
报告题目2：Atomic Layer Deposition of complex nanostructured materials with metal hexafluoride precursors
Jeff Elam is a Senior Chemist and Group Leader at Energy Systems Division, Argonne National Laboratory where he directs a program in atomic layer deposition (ALD) technology with the goal of developing new applications for ALD in fields such as photovoltaics, catalysis, batteries, lithography, and large-area detectors. Jeff earned his B.A. in Chemistry from Cornell University and his Ph.D. in Physical Chemistry from the University of Chicago. As a Postdoctoral Researcher at the University of Colorado, Jeff developed ALD thin film growth methods. Dr. Elam has authored over 200 papers and is an inventor on over 50 patents and inventions related to ALD. Jeff has won four R&D100 Awards, and is heavily involved in chairing and organizing ALD sessions at ECS and AVS.